In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Date Issued
2024-05
Author(s) USM
DOI
10.1063/5.0207496
Abstract
Small molecule inhibitors (SMIs) have been gaining attention in the field of area-selective atomic layer deposition (ALD) because they can be applied in the vapor-phase. A major challenge for SMIs is that vapor-phase application leads to a disordered inhi
