Ti-metalation of chitosan films by VPM, MPI and PEALD processes: An avenue to antiseptic scaffolds and functional biopolymers
Date Issued
2026-04
Author(s) USM
DOI
10.1016/j.apsadv.2026.100963
Abstract
This study investigates the impact of different Atomic Layer Deposition techniques on the Ti-metalation of chitosan (CS) for biomedical applications. Three methods - vapour phase metalation (VPM), multiplied pulsed vapour phase infiltration (MPI), and O2
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